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Time-Dependent gate oxide Breakdown
TDDB (Time-Dependent Dielectric breakdown) effect is a phenomenon that occurs in semiconductor chips where the insulating layer gradually deteriorates over time due to the constant flow of electrical current. This can lead to a breakdown in the chip's operation and ultimately failure. It's an important consideration for the long-term reliability of electronic devices.
※Test instruments or modules could be replaced based on real application
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Structure

SPEC. Low V

SPEC. Medium V

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